Improved Method of Nanopatterning Uses E-beam Write System

 
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PostPosted: Mon Jan 16, 2006 10:47 am    Post subject: Improved Method of Nanopatterning Uses E-beam Write System Reply with quote

University of Southampton Spin-Out Company Develops Improved Method of Nanopatterning Using the E-beam Direct Write System

Innos, the UK's leading research and development company for innovations in nanoscale technology, and the Nanoscale Systems Integration Group (NSI), today revealed how it is possible to accurately pattern layers of resist using e-beam direct write, with accuracies of a few tens of nanometres. The Supergen consortium EPSRC funded project is the first fabrication process to be completed by Innos, since signing an agreement with Philips to have full access to its MiPlaza facility in Eindhoven, following the Southampton fire on 30 October 2005.

The project has been completed by Innos for Dr Darren Bagnall and his team from the NSI, based in the School of Electronics and Computer Science at the University of Southampton [profile]. The project development work for biomimetic optical nanostructures attempts to mimic the nanostructured arrays seen on the cornea of certain night-flying moths.

Dr Bagnall explains: 'By using this type of nanostructure, we hope to create silicon surfaces that do not reflect light which would be very important for applications such as solar cells.'

Sales and Marketing Director at Innos, Alec Reader comments from the Innos head office in Southampton: 'It is testament to the team here at Innos that we have been able to seamlessly transfer activity to the MiPlaza facility and are completing processes so soon after the fire.'

Source: Innos.

URL: http://www.innos.co.uk/

This story was posted on 13 January 2006.
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